Sanctuary

For the passive skill, see Sanctuary (passive skill).

Sanctuary

Ascendancy Notable Passive Skill

You have Consecrated Ground around you while stationary
Consecrated Ground you create applies 15% increased Damage taken to Enemies [1]

Sanctuary is a notable Ascendancy passive skill for the Inquisitor that applies the effect of consecrated ground on them while not moving. It also causes enemies to take increased damage while affected by consecrated ground you created.

Ruthless mode

Sanctuary (Ruthless)

Ascendancy Notable Passive Skill

You have Consecrated Ground around you while stationary
Consecrated Ground you create applies 8% increased Damage taken to Enemies

Sanctuary in Ruthless mode causes Consecrated Ground to apply a weaker damage taken debuff against enemies.

Version history

Version	Changes
3.22.0	[Ruthless-specific This patch note only applies to Ruthless mode and does not affect the main game mode.] Now provides "Consecrated Ground you create applies 8% increased Damage taken to Enemies" in Ruthless (15% in non-Ruthless).
3.13.0	No longer grants Regenerate 15 Mana per Second while on Consecrated Ground. Now grants Consecrated Ground you create applies 10% increased Damage taken to Enemies (from 15%).
3.6.0	Renamed from Sanctify and reworked. Old: 30% chance to create Consecrated Ground when Hit, lasting 8 seconds, 30% chance to create Consecrated Ground on Kill, lasting 8 seconds, 10% chance to create Consecrated Ground when you Hit a Rare or Unique Enemy, lasting 8 seconds, Consecrated Ground you create grants 40% increased Damage to you and your Allies
3.2.0	Added 10% chance to create Consecrated Ground when you Hit a Rare or Unique Enemy, lasting 8 seconds.
3.0.0	Now grants a 30% chance to create Consecrated Ground when hit, as well as a 30% chance to create Consecrated Ground on kill (both up from 25%).
2.3.0	Consecrated Ground duration increased from 3 seconds to 8 seconds. Added Consecrated Ground you create grants 40% increased Damage to you and Allies.
2.2.0	Added to the game.